Upper chamber for a plasma processing apparatus



FIG. 1 is a front and top perspective of an upper chamber for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6; and,

FIG. 9 is a partially enlarged view taken along line 9-9 of FIG. 8. 

CLAIM The ornamental design for an upper chamber for a plasma processing apparatus, as shown and described. 